The key to Moore's Law: Lithography

The presentation will be given by Gerbert ten Brinke from ASML.

Abstract

The phenomenal growth of the semiconductor industry has been driven by Moore’s Law, named after Intel co-founder Gordon Moore. In 1965, Moore predicted that the number of components on a chip would double every 12 months; he later adjusted the period to two years. Moore's Law has inspired generations of engineers to push technology forward, as manufacturers strive to stay ahead of their competitors and fulfil the prediction.

As a company that makes the lithography machines to manufacture these chips, Moore’s Law also drives our business. In fact, the key to making transistors on a chip smaller is lithography.

For three decades, we have kept up with Moore’s Law by constantly improving the capabilities of our lithography machines, allowing our customers to make smaller, faster and more energy-efficient chips. To make this happen, we invest heavily in developing cutting-edge technology. We employ more than 5,000 engineers in research and development (R&D), with an annual budget of around €1 billion. Our major R&D sites are in the Netherlands (Veldhoven), at three locations in the United States (Wilton, Santa Clara and San Diego), in Taiwan (Linkou) and China (Shanghai). This R&D investment results in constant innovation, enabling our customers to develop chips for new devices and new applications, benefiting us all: from smartphones and wearable sensors, to tablets and car electronics.

At the heart of ASML’s product portfolio is the lithography system, also called a scanner. To help our customers sustain Moore’s Law and shrink the size of transistors on a chip, we must continuously improve the capabilities of our systems to image smaller features with accuracy. The presentation will focus on the current technology and how ASML contributes to the continuation of Moore's Law with the next generation lithography systems, known as EUV.

Short Bio

dr.ir. Gerbert ten Brinke was born in Enter, The Netherlands, in 1979. After finishing Electronics, MTS Hengelo and receiving a BSc in Computer Technology, Saxion Enschede he started Electronics Engineering at the University of Twente where he received his MSc.In 2011 he received his Ph.D. degree for his thesis ”Automated Coronary Flow reserve Assessment Using Planar X-ray Angiography” also from the University of Twente.

Since August 2010, Gerbert is working at ASML, Eindhoven. Two years as an embedded software designer for the NXT waferstage and currently as mechatronics design engineer as a member of the functions team. This team is responsible for the functional behavior of the waferstage in the scope of electronics, mechanics and software.